High-purity fused silica (SiO₂ ≥ 99.99%), categorized into natural quartz and synthetic quartz. Synthetic quartz features higher purity with a corresponding higher cost, meeting ultra-high standard industrial application needs.
Achieves stable and sustainable service at 1100℃, supports short-term extreme temperature resistance up to 1250℃, with a material softening point of approximately 1730℃, adapting to various high-temperature experimental and production environments.
Equipped with extremely low metallic impurity content, effectively avoiding wafer contamination during use. It fully meets the strict high cleanliness requirements of the semiconductor and photovoltaic industries.
Resistant to erosion from strong acids (HCl, HF), strong alkalis and high-temperature corrosive gases, perfectly suitable for industrial diffusion and oxidation process environments.
Boasts an extremely low coefficient of thermal expansion (5.5×10⁻⁷/K). It delivers outstanding thermal shock resistance, and will not crack or damage under rapid temperature change conditions.
Features excellent electrical insulation performance, with good transmittance for ultraviolet and infrared rays, widely applicable to photolithography processing and optical monitoring scenarios.